{"id":2218,"date":"2017-02-05T08:55:40","date_gmt":"2017-02-05T00:55:40","guid":{"rendered":"http:\/\/www.xxyyfy.com\/?p=2218"},"modified":"2017-04-24T14:32:28","modified_gmt":"2017-04-24T06:32:28","slug":"%e5%8d%8a%e5%af%bc%e4%bd%93%e4%b8%93%e4%b8%9a%e8%af%8d%e6%b1%87%e8%8b%b1%e8%af%ad%e7%bf%bb%e8%af%91","status":"publish","type":"post","link":"http:\/\/www.xxyyfy.com\/?p=2218","title":{"rendered":"\u534a\u5bfc\u4f53\u4e13\u4e1a\u8bcd\u6c47\u82f1\u8bd1"},"content":{"rendered":"

\n\t\"\"
\n<\/span>\n<\/p>\n

\n\t
\n<\/span>\n<\/p>\n

\n\t1. acceptance testing (WAT: wafer acceptance testing) \u9a8c\u6536\u6d4b\u8bd5\uff08\u6676\u5706\/\u6676\u7247\u9a8c\u6536\u6d4b\u8bd5\uff09<\/span>\n<\/p>\n

2. acceptor: \u53d7\u4e3b\uff0c\u5982B\uff0c\u63ba\u5165Si\u4e2d\u9700\u8981\u63a5\u53d7\u7535\u5b50<\/span>
\n3. ACCESS\uff1a\u4e00\u4e2aEDA\uff08Engineering Data Analysis\uff09\u7cfb\u7edf\uff1a\u4e00\u4e2aEDA(\u5de5\u7a0b\u6570\u636e\u5206\u6790\uff09<\/span>
\n4. Acid\uff1a\u9178<\/span>
\n5. Active device\uff1a\u6709\u6e90\u5668\u4ef6\uff0c\u5982MOS FET\uff08\u975e\u7ebf\u6027\uff0c\u53ef\u4ee5\u5bf9\u4fe1\u53f7\u653e\u5927\uff09<\/span>
\n6. Align mark(key)\uff1a\u5bf9\u4f4d\u6807\u8bb0<\/span>
\n7. Alloy\uff1a\u5408\u91d1<\/span>
\n8. Aluminum\uff1a\u94dd<\/span>
\n9. Ammonia\uff1a\u6c28\u6c34<\/span>
\n10. Ammonium fluoride\uff1aNH4F<\/span> <\/span>\u6c1f\u5316\u94f5<\/span>
\n11. Ammonium hydroxide\uff1aNH4OH \u6c22\u6c27\u5316\u94f5<\/span>
\n12. Amorphous silicon\uff1a\u03b1-Si\uff0c\u975e\u6676\u7845\uff08\u4e0d\u662f\u591a\u6676\u7845\uff09<\/span>
\n13. Analog\uff1a\u6a21\u62df\u7684<\/span>
\n14. Angstrom\uff1aA\uff081E-10m\uff09\u57c3<\/span>
\n15. Anisotropic\uff1a\u5404\u5411\u5f02\u6027\uff0c\u975e\u5747\u8d28\uff08\u5982POLY ETCH\uff09<\/span>
\n16. AQL(Acceptance Quality Level)\uff1a\u63a5\u53d7\u8d28\u91cf\u6807\u51c6\uff0c\u5728\u4e00\u5b9a\u91c7\u6837\u4e0b\uff0c\u53ef\u4ee595%\u7f6e\u4fe1\u5ea6\u901a\u8fc7\u8d28\u91cf\u6807\u51c6\uff08\u4e0d\u540c\u4e8e\u53ef\u9760\u6027\uff0c\u53ef\u9760\u6027\u8981\u6c42\u4e00\u5b9a\u65f6\u95f4\u540e\u7684\u5931\u6548\u7387\uff09<\/span>
\n17. ARC(Antireflective coating)\uff1a\u6297\u53cd\u5c04\u5c42\uff08\u7528\u4e8eMETAL\u7b49\u5c42\u7684\u5149\u523b\uff09<\/span>
\n18. Antimony(Sb)\u9511<\/span>
\n19. Argon(Ar)\u6c29<\/span>
\n20. Arsenic(As)\u7837<\/span>
\n21. Arsenic trioxide(As2O3)\u4e09\u6c27\u5316\u4e8c\u7837<\/span>
\n22. Arsine(AsH3) \u4e09\u6c22\u7837\u5316<\/span>
\n23. Asher\uff1a\u53bb\u80f6\u673a<\/span>
\n24. Aspect ration\uff1a\u5f62\u8c8c\u6bd4\uff08ETCH\u4e2d\u7684\u6df1\u5ea6\u3001\u5bbd\u5ea6\u6bd4\uff09<\/span>
\n25. Autodoping\uff1a\u81ea\u6400\u6742\uff08\u5916\u5ef6\u65f6SUB\u7684\u6d53\u5ea6\u9ad8\uff0c\u5bfc\u81f4\u6709\u6742\u8d28\u84b8\u53d1\u5230\u73af\u5883\u4e2d\u540e\uff0c\u53c8\u56de\u63ba\u5230\u5916\u5ef6\u5c42\uff09<\/span>
\n26. Back end\uff1a\u540e\u6bb5\uff08CONTACT\u4ee5\u540e\u3001PCM\u6d4b\u8bd5\u524d\uff09<\/span>
\n27. Baseline\uff1a\u6807\u51c6\u6d41\u7a0b<\/span>
\n28. Benchmark\uff1a\u57fa\u51c6<\/span>
\n29. Bipolar\uff1a\u53cc\u6781<\/span>
\n30. Boat\uff1a\u6269\u6563\u7528\uff08\u77f3\u82f1\uff09\u821f<\/span>
\n31. CD\uff1a\uff08Critical Dimension\uff09\u4e34\u754c\uff08\u5173\u952e\uff09\u5c3a\u5bf8\u3002\u5728\u5de5\u827a\u4e0a\u901a\u5e38\u6307\u6761\u5bbd\uff0c\u4f8b\u5982POLY CD \u4e3a\u591a\u6676\u6761\u5bbd\u3002<\/span>
\n32. Character window\uff1a\u7279\u5f81\u7a97\u53e3\u3002\u7528\u6587\u5b57\u6216\u6570\u5b57\u63cf\u8ff0\u7684\u5305\u542b\u5de5\u827a\u6240\u6709\u7279\u6027\u7684\u4e00\u4e2a\u65b9\u5f62\u533a\u57df\u3002<\/span>
\n33. Chemical-mechanical polish\uff08CMP\uff09\uff1a\u5316\u5b66\u673a\u68b0\u629b\u5149\u6cd5\u3002\u4e00\u79cd\u53bb\u6389\u5706\u7247\u8868\u9762\u67d0\u79cd\u7269\u8d28\u7684\u65b9\u6cd5\u3002<\/span>
\n34. Chemical vapor deposition\uff08CVD\uff09\uff1a\u5316\u5b66\u6c7d\u76f8\u6dc0\u79ef\u3002\u4e00\u79cd\u901a\u8fc7\u5316\u5b66\u53cd\u5e94\u751f\u6210\u4e00\u5c42\u8584\u819c\u7684\u5de5\u827a\u3002<\/span>
\n35. Chip\uff1a\u788e\u7247\u6216\u82af\u7247\u3002<\/span>
\n36. CIM\uff1acomputer-integrated manufacturing\u7684\u7f29\u5199\u3002\u7528\u8ba1\u7b97\u673a\u63a7\u5236\u548c\u76d1\u63a7\u5236\u9020\u5de5\u827a\u7684\u4e00\u79cd\u7efc\u5408\u65b9\u5f0f\u3002<\/span>
\n37. Circuit design \uff1a\u7535\u8def\u8bbe\u8ba1\u3002\u4e00\u79cd\u5c06\u5404\u79cd\u5143\u5668\u4ef6\u8fde\u63a5\u8d77\u6765\u5b9e\u73b0\u4e00\u5b9a\u529f\u80fd\u7684\u6280\u672f\u3002<\/span>
\n38. Cleanroom\uff1a\u4e00\u79cd\u5728\u6e29\u5ea6\uff0c\u6e7f\u5ea6\u548c\u6d01\u51c0\u5ea6\u65b9\u9762\u90fd\u9700\u8981\u6ee1\u8db3\u67d0\u4e9b\u7279\u6b8a\u8981\u6c42\u7684\u7279\u5b9a\u533a\u57df\u3002<\/span>
\n39. Compensation doping\uff1a\u8865\u507f\u63ba\u6742\u3002\u5411P\u578b\u534a\u5bfc\u4f53\u63ba\u5165\u65bd\u4e3b\u6742\u8d28\u6216\u5411N\u578b\u63ba\u5165\u53d7\u4e3b\u6742\u8d28\u3002<\/span>
\n40. CMOS\uff1acomplementary metal oxide semiconductor\u7684\u7f29\u5199\u3002\u4e00\u79cd\u5c06PMOS\u548cNMOS\u5728\u540c\u4e00\u4e2a\u7845\u886c\u5e95\u4e0a\u6df7\u5408\u5236\u9020\u7684\u5de5\u827a\u3002<\/span>
\n41. Computer-aided design\uff08CAD\uff09\uff1a\u8ba1\u7b97\u673a\u8f85\u52a9\u8bbe\u8ba1\u3002<\/span>
\n42. Conductivity type\uff1a\u4f20\u5bfc\u7c7b\u578b\uff0c\u7531\u591a\u6570\u8f7d\u6d41\u5b50\u51b3\u5b9a\u3002\u5728N\u578b\u6750\u6599\u4e2d\u591a\u6570\u8f7d\u6d41\u5b50\u662f\u7535\u5b50\uff0c\u5728P\u578b\u6750\u6599\u4e2d\u591a\u6570\u8f7d\u6d41\u5b50\u662f\u7a7a\u7a74\u3002<\/span>
\n43. Contact\uff1a\u5b54\u3002\u5728\u5de5\u827a\u4e2d\u901a\u5e38\u6307\u5b541\uff0c\u5373\u8fde\u63a5\u94dd\u548c\u7845\u7684\u5b54\u3002<\/span>
\n44. Control chart\uff1a\u63a7\u5236\u56fe\u3002\u4e00\u79cd\u7528\u7edf\u8ba1\u6570\u636e\u63cf\u8ff0\u7684\u53ef\u4ee5\u4ee3\u8868\u5de5\u827a\u67d0\u79cd\u6027\u8d28\u7684\u66f2\u7ebf\u56fe\u8868\u3002<\/span>
\n45. Correlation\uff1a\u76f8\u5173\u6027\u3002<\/span>
\n46. Cp\uff1a\u5de5\u827a\u80fd\u529b\uff0c\u8be6\u89c1\u3002<\/span>
\n47. Cpk\uff1a\u5de5\u827a\u80fd\u529b\u6307\u6570\u3002<\/span>
\n48. Cycle time\uff1a\u5706\u7247\u505a\u5b8c\u67d0\u6bb5\u5de5\u827a\u6216\u8bbe\u5b9a\u5de5\u827a\u6bb5\u6240\u9700\u8981\u7684\u65f6\u95f4\u3002\u901a\u5e38\u7528\u6765\u8861\u91cf\u6d41\u901a\u901f\u5ea6\u7684\u5feb\u6162\u3002<\/span>
\n49. Damage\uff1a\u635f\u4f24\u3002\u5bf9\u4e8e\u5355\u6676\u4f53\u6765\u8bf4\uff0c\u6709\u65f6\u6676\u683c\u7f3a\u9677\u5728\u8868\u9762\u5904\u7406\u540e\u5f62\u6210\u65e0\u6cd5\u4fee\u590d\u7684\u53d8\u5f62\u4e5f\u53ef\u4ee5\u53eb\u505a\u635f\u4f24\u3002<\/span>
\n50. Defect density\uff1a\u7f3a\u9677\u5bc6\u5ea6\u3002\u5355\u4f4d\u9762\u79ef\u5185\u7684\u7f3a\u9677\u6570\u3002<\/span>
\n51. Depletion implant\uff1a\u8017\u5c3d\u6ce8\u5165\u3002\u4e00\u79cd\u5728\u6c9f\u9053\u4e2d\u6ce8\u5165\u79bb\u5b50\u5f62\u6210\u8017\u5c3d\u6676\u4f53\u7ba1\u7684\u6ce8\u5165\u5de5\u827a\u3002\uff08\u8017\u5c3d\u6676\u4f53\u7ba1\u6307\u5728\u6805\u538b\u4e3a\u96f6\u7684\u60c5\u51b5\u4e0b\u6709\u7535\u6d41\u6d41\u8fc7\u7684\u6676\u4f53\u7ba1\u3002\uff09<\/span>
\n52. Depletion layer\uff1a\u8017\u5c3d\u5c42\u3002\u53ef\u52a8\u8f7d\u6d41\u5b50\u5bc6\u5ea6\u8fdc\u4f4e\u4e8e\u65bd\u4e3b\u548c\u53d7\u4e3b\u7684\u56fa\u5b9a\u7535\u8377\u5bc6\u5ea6\u7684\u533a\u57df\u3002<\/span>
\n53. Depletion width\uff1a\u8017\u5c3d\u5bbd\u5ea6\u300253\u4e2d\u63d0\u5230\u7684\u8017\u5c3d\u5c42\u8fd9\u4e2a\u533a\u57df\u7684\u5bbd\u5ea6\u3002<\/span>
\n54. Deposition\uff1a\u6dc0\u79ef\u3002\u4e00\u79cd\u5728\u5706\u7247\u4e0a\u6dc0\u79ef\u4e00\u5b9a\u539a\u5ea6\u7684\u4e14\u4e0d\u548c\u4e0b\u9762\u5c42\u6b21\u53d1\u751f\u5316\u5b66\u53cd\u5e94\u7684\u8584\u819c\u7684\u4e00\u79cd\u65b9\u6cd5\u3002<\/span>
\n55. Depth of focus\uff08DOF\uff09\uff1a\u7126\u6df1\u3002<\/span>
\n56. design of experiments (DOE)\uff1a\u4e3a\u4e86\u8fbe\u5230\u8d39\u7528\u6700\u5c0f\u5316\u3001\u964d\u4f4e\u8bd5\u9a8c\u9519\u8bef\u3001\u4ee5\u53ca\u4fdd\u8bc1\u6570\u636e\u7ed3\u679c\u7684\u7edf\u8ba1\u5408\u7406\u6027\u7b49\u76ee\u7684\uff0c\u6240\u8bbe\u8ba1\u7684\u521d\u59cb\u5de5\u7a0b\u6279\u8bd5\u9a8c\u8ba1\u5212\u3002<\/span>
\n57. develop\uff1a\u663e\u5f71\uff08\u901a\u8fc7\u5316\u5b66\u5904\u7406\u9664\u53bb\u66dd\u5149\u533a\u57df\u7684\u5149\u523b\u80f6\uff0c\u5f62\u6210\u6240\u9700\u56fe\u5f62\u7684\u8fc7\u7a0b\uff09<\/span>
\n58. developer\uff1a\u2160\uff09\u663e\u5f71\u8bbe\u5907\uff1b \u2161\uff09\u663e\u5f71\u6db2<\/span>
\n59. diborane (B2H6)\uff1a\u4e59\u787c\u70f7\uff0c\u4e00\u79cd\u65e0\u8272\u3001\u6613\u6325\u53d1\u3001\u6709\u6bd2\u7684\u53ef\u71c3\u6c14\u4f53\uff0c\u5e38\u7528\u6765\u4f5c\u4e3a\u534a\u5bfc\u4f53\u751f\u4ea7\u4e2d\u7684\u787c\u6e90<\/span>
\n60. dichloromethane (CH2CL2)\uff1a\u4e8c\u6c2f\u7532\uff0c\u4e00\u79cd\u65e0\u8272\uff0c\u4e0d\u53ef\u71c3\uff0c\u4e0d\u53ef\u7206\u7684\u6db2\u4f53\u3002<\/span>
\n61. dichlorosilane (DSC)\uff1a\u4e8c\u6c2f\u7532\u7845\u70f7\uff0c\u4e00\u79cd\u53ef\u71c3\uff0c\u6709\u8150\u8680\u6027\uff0c\u65e0\u8272\uff0c\u5728\u6f6e\u6e7f\u73af\u5883\u4e0b\u6613\u6c34\u89e3\u7684\u7269\u8d28\uff0c\u5e38\u7528\u4e8e\u7845\u5916\u5ef6\u6216\u591a\u6676\u7845\u7684\u6210\u957f\uff0c\u4ee5\u53ca\u7528\u5728\u6c89\u79ef\u4e8c\u6c27\u5316\u7845\u3001\u6c2e\u5316\u7845\u65f6\u7684\u5316\u5b66\u6c14\u6c1b\u4e2d\u3002<\/span>
\n62. die\uff1a\u7845\u7247\u4e2d\u4e00\u4e2a\u5f88\u5c0f\u7684\u5355\u4f4d\uff0c\u5305\u62ec\u4e86\u8bbe\u8ba1\u5b8c\u6574\u7684\u5355\u4e2a\u82af\u7247\u4ee5\u53ca\u82af\u7247\u90bb\u8fd1\u6c34\u5e73\u548c\u5782\u76f4\u65b9\u5411\u4e0a\u7684\u90e8\u5206\u5212\u7247\u69fd\u533a\u57df\u3002<\/span>
\n63. dielectric\uff1a\u2160\uff09\u4ecb\u8d28\uff0c\u4e00\u79cd\u7edd\u7f18\u6750\u6599\uff1b \u2161\uff09\u7528\u4e8e\u9676\u74f7\u6216\u5851\u6599\u5c01\u88c5\u7684\u8868\u9762\u6750\u6599\uff0c\u53ef\u4ee5\u63d0\u4f9b\u7535\u7edd\u7f18\u529f\u80fd\u3002<\/span>
\n64. diffused layer\uff1a\u6269\u6563\u5c42\uff0c\u5373\u6742\u8d28\u79bb\u5b50\u901a\u8fc7\u56fa\u6001\u6269\u6563\u8fdb\u5165\u5355\u6676\u7845\u4e2d\uff0c\u5728\u4e34\u8fd1\u7845\u8868\u9762\u7684\u533a\u57df\u5f62\u6210\u4e0e\u886c\u5e95\u6750\u6599\u53cd\u578b\u7684\u6742\u8d28\u79bb\u5b50\u5c42\u3002<\/span>
\n65. disilane (Si2H6)\uff1a\u4e59\u7845\u70f7\uff0c\u4e00\u79cd\u65e0\u8272\u3001\u65e0\u8150\u8680\u6027\u3001\u6781\u6613\u71c3\u7684\u6c14\u4f53\uff0c\u71c3\u70e7\u65f6\u80fd\u4ea7\u751f\u9ad8\u706b\u7130\uff0c\u66b4\u9732\u5728\u7a7a\u6c14\u4e2d\u4f1a\u81ea\u71c3\u3002\u5728\u751f\u4ea7\u5149\u7535\u5355\u5143\u65f6\uff0c\u4e59\u7845\u70f7\u5e38\u7528\u4e8e\u6c89\u79ef\u591a\u6676\u7845\u8584\u819c\u3002<\/span>
\n66. drive-in\uff1a\u63a8\u9631\uff0c\u6307\u8fd0\u7528\u9ad8\u6e29\u8fc7\u7a0b\u4f7f\u6742\u8d28\u5728\u7845\u7247\u4e2d\u5206\u5e03\u6269\u6563\u3002<\/span>
\n67. dry etch\uff1a\u5e72\u523b\uff0c\u6307\u91c7\u7528\u53cd\u5e94\u6c14\u4f53\u6216\u7535\u79bb\u6c14\u4f53\u9664\u53bb\u7845\u7247\u67d0\u4e00\u5c42\u6b21\u4e2d\u672a\u53d7\u4fdd\u62a4\u533a\u57df\u7684\u6df7\u5408\u4e86\u7269\u7406\u8150\u8680\u53ca\u5316\u5b66\u8150\u8680\u7684\u5de5\u827a\u8fc7\u7a0b\u3002<\/span>
\n68. effective layer thickness\uff1a\u6709\u6548\u5c42\u539a\uff0c\u6307\u5728\u5916\u5ef6\u7247\u5236\u9020\u4e2d\uff0c\u8f7d\u6d41\u5b50\u5bc6\u5ea6\u5728\u89c4\u5b9a\u8303\u56f4\u5185\u7684\u7845\u952d\u524d\u7aef\u7684\u6df1\u5ea6\u3002<\/span>
\n69. EM\uff1aelectromigration\uff0c\u7535\u5b50\u8fc1\u79fb\uff0c\u6307\u7531\u901a\u8fc7\u94dd\u6761\u7684\u7535\u6d41\u5bfc\u81f4\u7535\u5b50\u6cbf\u94dd\u6761\u8fde\u7ebf\u8fdb\u884c\u7684\u81ea\u6269\u6563\u8fc7\u7a0b\u3002<\/span>
\n70. epitaxial layer\uff1a\u5916\u5ef6\u5c42\u3002\u534a\u5bfc\u4f53\u6280\u672f\u4e2d\uff0c\u5728\u51b3\u5b9a\u6676\u5411\u7684\u57fa\u8d28\u886c\u5e95\u4e0a\u751f\u957f\u4e00\u5c42\u5355\u6676\u534a\u5bfc\u4f53\u6750\u6599\uff0c\u8fd9\u4e00\u5355\u6676\u534a\u5bfc\u4f53\u5c42\u5373\u4e3a\u5916\u5ef6\u5c42\u3002<\/span>
\n71. equipment downtime\uff1a\u8bbe\u5907\u72b6\u6001\u5f02\u5e38\u4ee5\u53ca\u4e0d\u80fd\u5b8c\u6210\u9884\u5b9a\u529f\u80fd\u7684\u65f6\u95f4\u3002<\/span>
\n72. etch\uff1a\u8150\u8680\uff0c\u8fd0\u7528\u7269\u7406\u6216\u5316\u5b66\u65b9\u6cd5\u6709\u9009\u62e9\u7684\u53bb\u9664\u4e0d\u9700\u7684\u533a\u57df\u3002<\/span>
\n73. exposure\uff1a\u66dd\u5149\uff0c\u4f7f\u611f\u5149\u6750\u6599\u611f\u5149\u6216\u53d7\u5176\u4ed6\u8f90\u5c04\u6750\u6599\u7167\u5c04\u7684\u8fc7\u7a0b\u3002<\/span>
\n74. fab\uff1a\u5e38\u6307\u534a\u5bfc\u4f53\u751f\u4ea7\u7684\u5236\u9020\u5de5\u5382\u3002<\/span>
\n75. feature size\uff1a\u7279\u5f81\u5c3a\u5bf8\uff0c\u6307\u5355\u4e2a\u56fe\u5f62\u7684\u6700\u5c0f\u7269\u7406\u5c3a\u5bf8\u3002<\/span>
\n76. field-effect transistor\uff08FET\uff09\uff1a\u573a\u6548\u5e94\u7ba1\u3002\u5305\u542b\u6e90\u3001\u6f0f\u3001\u6805\u3001\u886c\u56db\u7aef\uff0c\u7531\u6e90\u7ecf\u6805\u5230\u6f0f\u7684\u591a\u5b50\u6d41\u9a71\u52a8\u800c\u5de5\u4f5c\uff0c\u591a\u5b50\u6d41\u7531\u6805\u4e0b\u7684\u6a2a\u5411\u7535\u573a\u63a7\u5236\u3002<\/span>
\n77. film\uff1a\u8584\u819c\uff0c\u5706\u7247\u4e0a\u7684\u4e00\u5c42\u6216\u591a\u5c42\u8fed\u52a0\u7684\u7269\u8d28\u3002<\/span>
\n78. flat\uff1a\u5e73\u8fb9<\/span>
\n79. flatband capacitanse\uff1a\u5e73\u5e26\u7535\u5bb9<\/span>
\n80. flatband voltage\uff1a\u5e73\u5e26\u7535\u538b<\/span>
\n81. flow coefficicent\uff1a\u6d41\u52a8\u7cfb\u6570<\/span>
\n82. flow velocity\uff1a\u6d41\u901f\u8ba1<\/span>
\n83. flow volume\uff1a\u6d41\u91cf\u8ba1<\/span>
\n84. flux\uff1a\u5355\u4f4d\u65f6\u95f4\u5185\u6d41\u8fc7\u7ed9\u5b9a\u9762\u79ef\u7684\u9897\u7c92\u6570<\/span>
\n85. forbidden energy gap\uff1a\u7981\u5e26<\/span>
\n86. four-point probe\uff1a\u56db\u70b9\u63a2\u9488\u53f0<\/span>
\n87. functional area\uff1a\u529f\u80fd\u533a<\/span>
\n88. gate oxide\uff1a\u6805\u6c27<\/span>
\n89. glass transition temperature\uff1a\u73bb\u7483\u6001\u8f6c\u6362\u6e29\u5ea6<\/span>
\n90. gowning\uff1a\u51c0\u5316\u670d<\/span>
\n91. gray area\uff1a\u7070\u533a<\/span>
\n92. grazing incidence interferometer\uff1a\u5207\u7ebf\u5165\u5c04\u5e72\u6d89\u4eea<\/span>
\n93. hard bake\uff1a\u540e\u70d8<\/span>
\n94. heteroepitaxy\uff1a\u5355\u6676\u957f\u5728\u4e0d\u540c\u6750\u6599\u7684\u886c\u5e95\u4e0a\u7684\u5916\u5ef6\u65b9\u6cd5<\/span>
\n95. high-current implanter\uff1a\u675f\u7535\u6d41\u5927\u4e8e3ma\u7684\u6ce8\u5165\u65b9\u5f0f\uff0c\u7528\u4e8e\u6279\u91cf\u751f\u4ea7<\/span>
\n96. hign-efficiency particulate air(HEPA) filter\uff1a\u9ad8\u6548\u7387\u7a7a\u6c14\u9897\u7c92\u8fc7\u6ee4\u5668\uff0c\u53bb\u638999.97%\u7684\u5927\u4e8e0.3um\u7684\u9897\u7c92<\/span>
\n97. host\uff1a\u4e3b\u673a<\/span>
\n98. hot carriers\uff1a\u70ed\u8f7d\u6d41\u5b50<\/span>
\n99. hydrophilic\uff1a\u4eb2\u6c34\u6027<\/span>
\n100. hydrophobic\uff1a\u758f\u6c34\u6027<\/span>
\n101. impurity\uff1a\u6742\u8d28<\/span>
\n102. inductive coupled plasma(ICP)\uff1a\u611f\u5e94\u7b49\u79bb\u5b50\u4f53<\/span>
\n103. inert gas\uff1a\u60f0\u6027\u6c14\u4f53<\/span>
\n104. initial oxide\uff1a\u4e00\u6c27<\/span>
\n105. insulator\uff1a\u7edd\u7f18<\/span>
\n106. isolated line\uff1a\u9694\u79bb\u7ebf<\/span>
\n107. implant : \u6ce8\u5165<\/span>
\n108. impurity n : \u63ba\u6742<\/span>
\n109. junction : \u7ed3<\/span>
\n110. junction spiking n :\u94dd\u7a7f\u523a<\/span>
\n111. kerf :\u5212\u7247\u69fd<\/span>
\n112. landing pad n :PAD<\/span>
\n113. lithography n \u5236\u7248<\/span>
\n114. maintainability, equipment : \u8bbe\u5907\u4ea7\u80fd<\/span>
\n115. maintenance n :\u4fdd\u517b<\/span>
\n116. majority carrier n :\u591a\u6570\u8f7d\u6d41\u5b50<\/span>
\n117. masks, device series of n : \u4e00\u6210\u5957\u5149\u523b\u7248<\/span>
\n118. material:\u539f\u6599<\/span>
\n119. matrix:\u77e9\u9635<\/span>
\n120. mean: \u5e73\u5747\u503c<\/span>
\n121. measured leak rate:\u6d4b\u5f97\u6f0f\u7387<\/span>
\n122. median:\u4e2d\u95f4\u503c<\/span>
\n123. memory: \u8bb0\u5fc6\u4f53<\/span>
\n124. metal:\u91d1\u5c5e<\/span>
\n125. nanometer (nm)\uff1a\u7eb3\u7c73<\/span>
\n126. nanosecond (ns)\uff1a\u7eb3\u79d2<\/span>
\n127. nitride etch\uff1a\u6c2e\u5316\u7269\u523b\u8680<\/span>
\n128. nitrogen (N2 )\uff1a\u6c2e\u6c14\uff0c\u4e00\u79cd\u53cc\u539f\u5b50\u6c14\u4f53<\/span>
\n129. n-type\uff1an\u578b<\/span>
\n130. ohms per square\uff1a\u6b27\u59c6\u6bcf\u5e73\u65b9: \u65b9\u5757\u7535\u963b<\/span>
\n131. orientation n\uff1a\u6676\u5411\uff0c\u4e00\u7ec4\u6676\u5217\u6240\u6307\u7684\u65b9\u5411<\/span>
\n132. overlap\uff1a\u4ea4\u8fed\u533a<\/span>
\n133. oxidation\uff1a\u6c27\u5316\uff0c\u9ad8\u6e29\u4e0b\u6c27\u6c14\u6216\u6c34\u84b8\u6c14\u4e0e\u7845\u8fdb\u884c\u7684\u5316\u5b66\u53cd\u5e94<\/span>
\n134. phosphorus (P)\uff1a\u78f7 \uff0c\u4e00\u79cd\u6709\u6bd2\u7684\u975e\u91d1\u5c5e\u5143\u7d20<\/span>
\n135. photomask\uff1a\u5149\u523b\u7248\uff0c\u7528\u4e8e\u5149\u523b\u7684\u7248<\/span>
\n136. photomask, negative\uff1a\u53cd\u523b<\/span>
\n137. images\uff1a\u53bb\u6389\u56fe\u5f62\u533a\u57df\u7684\u7248<\/span>
\n138. photomask, positive\uff1a\u6b63\u523b<\/span>
\n139. pilot\uff1a\u5148\u884c\u6279\uff0c\u7528\u4ee5\u9a8c\u8bc1\u8be5\u5de5\u827a\u662f\u5426\u7b26\u5408\u89c4\u683c\u7684\u7247\u5b50<\/span>
\n140. plasma\uff1a\u7b49\u79bb\u5b50\u4f53\uff0c\u7528\u4e8e\u53bb\u80f6\u3001\u523b\u8680\u6216\u6dc0\u79ef\u7684\u7535\u79bb\u6c14\u4f53<\/span>
\n141. plasma-enhanced chemical vapor deposition (PECVD)\uff1a\u7b49\u79bb\u5b50\u4f53\u5316\u5b66\u6c14\u76f8\u6dc0\u79ef\uff0c\u4f4e\u6e29\u6761\u4ef6\u4e0b\u7684\u7b49\u79bb\u5b50\u6dc0\u79ef\u5de5\u827a<\/span>
\n142. plasma-enhanced TEOS oxide deposition\uff1aTEOS\u6dc0\u79ef\uff0c\u6dc0\u79efTEOS\u7684\u4e00\u79cd\u5de5\u827a<\/span>
\n143. pn junction\uff1apn\u7ed3<\/span>
\n144. pocked bead\uff1a\u9ebb\u70b9\uff0c\u572820X\u4e0b\u89c2\u5bdf\u5230\u7684\u5438\u9644\u5728\u4f4e\u538b\u8868\u9762\u7684\u6c34\u73e0<\/span>
\n145. polarization\uff1a\u504f\u632f\uff0c\u63cf\u8ff0\u7535\u78c1\u6ce2\u4e0b\u7535\u573a\u77e2\u91cf\u65b9\u5411\u7684\u672f\u8bed<\/span>
\n146. polycide\uff1a\u591a\u6676\u7845 \/\u91d1\u5c5e\u7845\u5316\u7269\uff0c \u89e3\u51b3\u9ad8\u963b\u7684\u590d\u5408\u6805\u7ed3\u6784<\/span>
\n147. polycrystalline silicon (poly)\uff1a\u591a\u6676\u7845\uff0c\u9ad8\u6d53\u5ea6\u63ba\u6742\uff08>5E19\uff09\u7684\u7845\uff0c\u80fd\u5bfc\u7535\u3002<\/span>
\n148. polymorphism\uff1a\u591a\u6001\u73b0\u8c61\uff0c\u591a\u6676\u5f62\u6210\u4e00\u79cd\u5316\u5408\u7269\u4ee5\u81f3\u5c11\u4e24\u79cd\u4e0d\u540c\u7684\u5f62\u6001\u7ed3\u6676\u7684\u73b0\u8c61<\/span>
\n149. prober:\u63a2\u9488\u3002\u5728\u96c6\u6210\u7535\u8def\u7684\u7535\u6d41\u6d4b\u8bd5\u4e2d\u4f7f\u7528\u7684\u4e00\u79cd\u8bbe\u5907\uff0c\u7528\u4ee5\u8fde\u63a5\u5706\u7247\u548c\u68c0\u6d4b\u8bbe\u5907\u3002<\/span>
\n150. process control:\u8fc7\u7a0b\u63a7\u5236\u3002\u534a\u5bfc\u4f53\u5236\u9020\u8fc7\u7a0b\u4e2d\uff0c\u5bf9\u8bbe\u5907\u6216\u4ea7\u54c1\u89c4\u8303\u7684\u63a7\u5236\u80fd\u529b\u3002<\/span>
\n151. proximity X-ray:\u8fd1X\u5c04\u7ebf\uff1a\u4e00\u79cd\u5149\u523b\u6280\u672f\uff0c\u7528X\u5c04\u7ebf\u7167\u5c04\u7f6e\u4e8e\u5149\u523b\u80f6\u4e0a\u65b9\u7684\u63a9\u819c\u7248\uff0c\u4ece\u800c\u4f7f\u5bf9\u5e94\u7684\u5149\u523b\u80f6\u66b4\u5149\u3002<\/span>
\n152. pure water: \u7eaf\u6c34\u3002\u534a\u5bfc\u4f53\u751f\u4ea7\u4e2d\u6240\u7528\u4e4b\u6c34\u3002<\/span>
\n153. quantum device:\u91cf\u5b50\u8bbe\u5907\u3002\u4e00\u79cd\u7535\u5b50\u8bbe\u5907\u7ed3\u6784\uff0c\u5176\u7279\u6027\u6e90\u4e8e\u7535\u5b50\u7684\u6ce2\u52a8\u6027\u3002<\/span>
\n154. quartz carrier:\u77f3\u82f1\u821f\u3002<\/span>
\n155. random access memory (RAM):\u968f\u673a\u5b58\u50a8\u5668\u3002<\/span>
\n156. random logic device:\u968f\u673a\u903b\u8f91\u5668\u4ef6\u3002<\/span>
\n157. rapid thermal processing (RTP):\u5feb\u901f\u70ed\u5904\u7406(RTP)\u3002<\/span>
\n158. reactive ion etch (RIE): \u53cd\u5e94\u79bb\u5b50\u523b\u8680(RIE)\u3002<\/span>
\n159. reactor:\u53cd\u5e94\u8154\u3002\u53cd\u5e94\u8fdb\u884c\u7684\u5bc6\u5c01\u9694\u79bb\u8154\u3002<\/span>
\n160. recipe:\u83dc\u5355\u3002\u751f\u4ea7\u8fc7\u7a0b\u4e2d\u5bf9\u5706\u7247\u6240\u505a\u7684\u6bcf\u4e00\u6b65\u5904\u7406\u89c4\u8303\u3002<\/span>
\n161. resist:\u5149\u523b\u80f6\u3002<\/span>
\n162. scanning electron microscope (SEM):\u7535\u5b50\u663e\u5fae\u955c(SEM)\u3002<\/span>
\n163. scheduled downtime: (\u8bbe\u5907)\u9884\u5b9a\u505c\u5de5\u65f6\u95f4\u3002<\/span>
\n164. Schottky barrier diodes:\u8096\u7279\u57fa\u4e8c\u6781\u7ba1\u3002<\/span>
\n165. scribe line:\u5212\u7247\u69fd\u3002<\/span>
\n166. sacrificial etchback:\u727a\u7272\u8150\u8680\u3002<\/span>
\n167. semiconductor:\u534a\u5bfc\u4f53\u3002\u7535\u5bfc\u6027\u4ecb\u4e8e\u5bfc\u4f53\u548c\u7edd\u7f18\u4f53\u4e4b\u95f4\u7684\u5143\u7d20\u3002<\/span>
\n168. sheet resistance (Rs) (or per square):\u8584\u5c42\u7535\u963b\u3002\u4e00\u822c\u7528\u4ee5\u8861\u91cf\u534a\u5bfc\u4f53\u8868\u9762\u6742\u8d28\u63ba\u6742\u6c34\u5e73\u3002<\/span>
\n169. side load: \u8fb9\u7f18\u8f7d\u8377\uff0c\u88ab\u5f2f\u66f2\u540e\u4ea7\u751f\u7684\u5e94\u529b\u3002<\/span>
\n170. silicon on sapphire(SOS)epitaxial wafer:\u5916\u5ef6\u662f\u84dd\u5b9d\u77f3\u886c\u5e95\u7845\u7684\u539f\u7247<\/span>
\n171. small scale integration(SSI):\u5c0f\u89c4\u6a21\u7efc\u5408\uff0c\u5728\u5355\u4e00\u6a21\u5757\u4e0a\u75312\u523010\u4e2a\u56fe\u6848\u7684\u5e03\u5c40\u3002<\/span>
\n172. source code:\u539f\u4ee3\u7801\uff0c\u673a\u5668\u4ee3\u7801\u7f16\u8bd1\u8005\u4f7f\u7528\u7684\uff0c\u8f93\u5165\u5230\u7a0b\u5e8f\u8bbe\u8ba1\u8bed\u8a00\u91cc\u6216\u7f16\u7801\u5668\u7684\u4ee3\u7801\u3002<\/span>
\n173. spectral line: \u5149\u8c31\u7ebf\uff0c\u5149\u8c31\u954a\u5236\u673a\u6216\u5206\u5149\u8ba1\u5728\u7126\u5e73\u9762\u4e0a\u6355\u6349\u5230\u7684\u72ed\u957f\u72b6\u7684\u56fe\u5f62\u3002<\/span>
\n174. spin webbing: \u65cb\u8f6c\u5e26\uff0c\u5728\u65cb\u8f6c\u8fc7\u7a0b\u4e2d\u5728\u4e0b\u8868\u9762\u5f62\u6210\u7684\u7ec6\u4e1d\u72b6\u7684\u5269\u4f59\u7269\u3002<\/span>
\n175. sputter etch: \u6e85\u5c04\u523b\u8680\uff0c\u4ece\u79bb\u5b50\u8f70\u51fb\u4ea7\u751f\u7684\u8868\u9762\u9664\u53bb\u8584\u819c\u3002<\/span>
\n176. stacking fault:\u5806\u579b\u5c42\u9519\uff0c\u539f\u5b50\u666e\u901a\u5806\u79ef\u89c4\u5f8b\u7684\u80cc\u79bb\u4ea7\u751f\u76842\u6b21\u7a7a\u95f4\u9519\u8bef\u3002<\/span>
\n177. steam bath:\u84b8\u6c7d\u6d74\uff0c\u4e00\u4e2a\u5927\u6c14\u538b\u4e0b\uff0c\u6d41\u52a8\u84b8\u6c7d\u6216\u5176\u4ed6\u6e29\u5ea6\u70ed\u6e90\u7684\u66b4\u5149\u3002<\/span>
\n178. step response time:\u77ac\u6001\u7279\u6027\u65f6\u95f4\uff0c\u5927\u591a\u6570\u6d41\u91cf\u63a7\u5236\u5668\u5b9e\u9a8c\u4e2d\uff0c\u666e\u901a\u53d8\u5316\u65f6\u6bb5\u5230\u6c14\u6d41\u521a\u5230\u8fbe\u7279\u5b9a\u5730\u5e26\u7684\u90a3\u4e2a\u65f6\u523b\u4e4b\u95f4\u7684\u65f6\u95f4\u3002<\/span>
\n179. stepper: \u6b65\u8fdb\u5149\u523b\u673a\uff08\u6309BLOCK\u6765\u66dd\u5149\uff09<\/span>
\n180. stress test: \u5e94\u529b\u6d4b\u8bd5\uff0c\u5305\u62ec\u7279\u5b9a\u7684\u7535\u538b\u3001\u6e29\u5ea6\u3001\u6e7f\u5ea6\u6761\u4ef6\u3002<\/span>
\n181. surface profile:\u8868\u9762\u8f6e\u5ed3\uff0c\u6307\u4e0e\u539f\u7247\u8868\u9762\u5782\u76f4\u7684\u5e73\u9762\u7684\u8f6e\u5ed3\uff08\u6ca1\u6709\u7279\u6307\u7684\u60c5\u51b5\u4e0b\uff09\u3002<\/span>
\n182. symptom:\u5f81\u5146\uff0c\u4eba\u5458\u611f\u89c9\u5230\u5728\u4e00\u5b9a\u6761\u4ef6\u4e0b\u4ea7\u751f\u53d8\u5316\u7684\u5f0a\u75c5\u7684\u4e3b\u89c2\u8ba4\u8bc6\u3002<\/span>
\n183. tack weld:\u95f4\u65ad\u710a\uff0c\u901a\u5e38\u5728\u89d2\u843d\u4e0a\u5bfb\u627e\u9884\u5148\u6709\u7684\u5730\u70b9\u8fdb\u884c\u7684\u70b9\u710a\uff08\u7528\u4e8e\u8fde\u63a5\u76d6\u5b50\uff09\u3002<\/span>
\n184. Taylor tray:\u6cf0\u52d2\u76d8\uff0c\u8910\u62c8\u571f\u7ec4\u6210\u7684\u9ad8\u81a8\u80c0\u7269\u8d28\u3002<\/span>
\n185. temperature cycling:\u6e29\u5ea6\u5468\u671f\u53d8\u5316\uff0c\u6d4b\u91cf\u51fa\u7684\u91cd\u590d\u51fa\u73b0\u76f8\u7c7b\u4f3c\u7684\u9ad8\u4f4e\u6e29\u5faa\u73af\u3002<\/span>
\n186. testability:\u6613\u6d4b\u6027\uff0c\u5bf9\u4e8e\u4e00\u4e2a\u5df2\u7ed9\u7535\u8def\u6765\u8bf4\uff0c\u54ea\u4e9b\u6d4b\u8bd5\u662f\u9002\u7528\u5b83\u7684\u3002<\/span>
\n187. thermal deposition:\u70ed\u6c89\u79ef\uff0c\u5728\u8d85\u8fc7950\u5ea6\u7684\u9ad8\u6e29\u4e0b\uff0c\u7845\u7247\u5f15\u5165\u5316\u5b66\u63ba\u6742\u7269\u7684\u8fc7\u7a0b\u3002<\/span>
\n188. thin film:\u8d85\u8584\u8584\u819c\uff0c\u5806\u79ef\u5728\u539f\u7247\u8868\u9762\u7684\u7528\u4e8e\u4f20\u5bfc\u6216\u7edd\u7f18\u7684\u4e00\u5c42\u7279\u6b8a\u8584\u819c\u3002<\/span>
\n189. titanium(Ti): \u949b\u3002<\/span>
\n190. toluene(C6H5CH3): \u7532\u82ef\u3002\u6709\u6bd2\u3001\u65e0\u8272\u6613\u71c3\u7684\u6db2\u4f53\uff0c\u5b83\u4e0d\u6eb6\u4e8e\u6c34\u4f46\u6eb6\u4e8e\u9152\u7cbe\u548c\u5927\u6c14\u3002<\/span>
\n191. 1,1,1-trichloroethane(TCA)(CL3CCH3): \u6709\u6bd2\u3001\u4e0d\u6613\u71c3\u3001\u6709\u523a\u6fc0\u6027\u6c14\u5473\u7684\u6db2\u6001\u6eb6\u5242\u3002\u8fd9\u79cd\u6df7\u5408\u7269\u4e0d\u6eb6\u4e8e\u6c34\u4f46\u6eb6\u4e8e\u9152\u7cbe\u548c\u5927\u6c14\u3002<\/span>
\n192. tungsten(W): \u94a8\u3002<\/span>
\n193. tungsten hexafluoride(WF6): \u6c1f\u5316\u94a8\u3002\u65e0\u8272\u65e0\u5473\u7684\u6c14\u4f53\u6216\u8005\u662f\u6de1\u9ec4\u8272\u6db2\u4f53\u3002\u5728CVD\u4e2dWF6\u7528\u4e8e\u6dc0\u79ef\u7845\u5316\u7269\uff0c\u4e5f\u53ef\u7528\u4e8e\u94a8\u4f20\u5bfc\u7684\u8584\u819c\u3002<\/span>
\n194. tinning: \u91d1\u5c5e\u6027\u8868\u9762\u8986\u76d6\u710a\u70b9\u7684\u8584\u5c42\u3002<\/span>
\n195. total fixed charge density(Nth): \u4e0b\u5217\u662f\u7845\u8868\u9762\u4e0d\u53ef\u52a8\u7535\u8377\u5bc6\u5ea6\u7684\u603b\u548c\uff1a\u6c27\u5316\u5c42\u56fa\u5b9a\u7535\u8377\u5bc6\u5ea6(Nf)\u3001\u6c27\u5316\u5c42\u4fd8\u83b7\u7684\u7535\u8377\u7684\u5bc6\u5ea6(Not)\u3001\u754c\u9762\u8d1f\u83b7\u5f97\u7535\u8377\u5bc6\u5ea6(Nit)\u3002<\/span>
\n196. watt(W): \u74e6\u3002\u80fd\u91cf\u5355\u4f4d\u3002<\/span>
\n197. wafer flat: \u4ece\u6676\u7247\u7684\u4e00\u9762\u76f4\u63a5\u5207\u4e0b\u53bb\uff0c\u7528\u4e8e\u8868\u660e\u81ea\u7531\u8f7d\u6d41\u5b50\u7684\u5bfc\u7535\u7c7b\u578b\u548c\u6676\u4f53\u8868\u9762\u7684\u6676\u5411\uff0c\u4e5f\u53ef\u7528\u4e8e\u5728\u5904\u7406\u548c\u96d5\u5408\u8fc7\u7a0b\u4e2d\u7684\u6392\u5217\u6676\u7247\u3002<\/span>
\n198. wafer process chamber(WPC): \u5bf9\u6676\u7247\u8fdb\u884c\u5de5\u827a\u7684\u8154\u4f53\u3002<\/span>
\n199. well: \u9631\u3002<\/span>
\n200. wet chemical etch: \u6e7f\u6cd5\u5316\u5b66\u8150\u8680\u3002<\/span>
\n201. trench: \u6df1\u8150\u8680\u533a\u57df\uff0c\u7528\u4e8e\u4ece\u53e6\u4e00\u533a\u57df\u9694\u79bb\u51fa\u4e00\u4e2a\u533a\u57df\u6216\u8005\u5728\u7845\u6676\u7247\u4e0a\u5f62\u6210\u5b58\u50a8\u7535\u5bb9\u5668\u3002<\/span>
\n202. via: \u901a\u5b54\u3002\u4f7f\u9694\u7740\u7535\u4ecb\u8d28\u7684\u4e0a\u4e0b\u4e24\u5c42\u91d1\u5c5e\u5b9e\u73b0\u7535\u8fde\u63a5\u3002<\/span>
\n203. window: \u5728\u9694\u79bb\u6676\u7247\u4e2d\uff0c\u5141\u8bb8\u4e0a\u4e0b\u4e24\u5c42\u5b9e\u73b0\u7535\u8fde\u63a5\u7684\u7edd\u7f18\u7684\u901a\u9053\u3002<\/span>
\n204. torr : \u6258\u3002\u538b\u529b\u7684\u5355\u4f4d\u3002<\/span>
\n205. vapor pressure: \u5f53\u56fa\u4f53\u6216\u6db2\u4f53\u5904\u4e8e\u5e73\u8861\u6001\u65f6\u81ea\u5df1\u62e5\u6709\u7684\u84b8\u6c7d\u6240\u65bd\u52a0\u7684\u538b\u529b\u3002\u84b8\u6c7d\u538b\u529b\u662f\u4e0e\u7269\u8d28\u548c\u6e29\u5ea6\u6709\u5173\u7684\u51fd\u6570\u3002<\/span>
\n206. vacuum: \u771f\u7a7a\u3002<\/span><\/p>\n

\n\t207. transition metals: \u8fc7\u6e21\u91d1\u5c5e\u3002<\/span>\n<\/p>\n

\n\t
\n<\/span>\n<\/p>\n

\n\t\u5fc3\u8bd1\u7ffb\u8bd1\u5de5\u4f5c\u5ba4<\/span><\/a><\/span><\/p>\n","protected":false},"excerpt":{"rendered":"1. acceptance testing (WAT: wafer acceptance testing) \u9a8c […]","protected":false},"author":3,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[20,44],"tags":[],"class_list":["post-2218","post","type-post","status-publish","format-standard","hentry","category-20","category-44"],"views":3206,"_links":{"self":[{"href":"http:\/\/www.xxyyfy.com\/index.php?rest_route=\/wp\/v2\/posts\/2218"}],"collection":[{"href":"http:\/\/www.xxyyfy.com\/index.php?rest_route=\/wp\/v2\/posts"}],"about":[{"href":"http:\/\/www.xxyyfy.com\/index.php?rest_route=\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"http:\/\/www.xxyyfy.com\/index.php?rest_route=\/wp\/v2\/users\/3"}],"replies":[{"embeddable":true,"href":"http:\/\/www.xxyyfy.com\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=2218"}],"version-history":[{"count":0,"href":"http:\/\/www.xxyyfy.com\/index.php?rest_route=\/wp\/v2\/posts\/2218\/revisions"}],"wp:attachment":[{"href":"http:\/\/www.xxyyfy.com\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=2218"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"http:\/\/www.xxyyfy.com\/index.php?rest_route=%2Fwp%2Fv2%2Fcategories&post=2218"},{"taxonomy":"post_tag","embeddable":true,"href":"http:\/\/www.xxyyfy.com\/index.php?rest_route=%2Fwp%2Fv2%2Ftags&post=2218"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}